研究生: |
林柏宏 |
---|---|
論文名稱: |
光學記錄點之近場光學影像的研究 Near-field Imaging of Optical Recording Marks |
指導教授: |
劉威志
Liu, Wei-Chih 蔡定平 Tsai, Din-Ping |
學位類別: |
碩士 Master |
系所名稱: |
光電工程研究所 Graduate Institute of Electro-Optical Engineering |
論文出版年: | 2004 |
畢業學年度: | 92 |
語文別: | 中文 |
論文頁數: | 69 |
中文關鍵詞: | 近場光學顯微術 、記錄點 、相變化材料 、剪力式 |
英文關鍵詞: | Near-field Scanning Optical Microscopy, Recording Marks, Phase-change material, Shear force mode |
論文種類: | 學術論文 |
相關次數: | 點閱:266 下載:3 |
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在本論文中,使用掃探式近場光學顯微儀(NSOM)中的剪力式工作模式,藉由光纖探針送光,進行光碟片中記錄層的近場光學量測,並獲得高空間解析的近場光學影像。
我們首先用靜態測試儀,在以玻璃為基底,並上下夾以保護層的記錄層上寫入記錄點。再從近場光學量測中,比較不同寫入功率及寫入時間在記錄層的變化,以了解相變化記錄層的熱效應影響。
之後我們再以商用的光碟測試機,在記錄層上寫入記錄點,其中樣品從前面的玻璃基底更換為商用DVD-RW的塑膠基底,再藉由近場光學量測觀察光碟片上的記錄點。
It is interesting to observe recording marks of phase-change optical disks. In this paper, we measured topography and near-field optical imaging of the recording layer by near-field optical scanning microscope (NSOM).
First, we used the static tester writing recording marks in phase change optical layer (Ge2Sb2Te5). The structure of the sample is Glass\ZnS-SiO2(130nm)\Ge2Sb2Te5(20nm)\ZnS-SiO2(20nm). We changed the writing power and the writing time. Studying different writing conditions, we can understand thermal effects of recording layer.
Then, we observe recording marks in commercial optical disks using NSOM. From near-field optical imaging, we obtained higher resolution and observed optical recording marks smaller than 200nm.
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