本實驗依照公司產學需求來製鍍帶通濾光片，因製程要求簡單，所以使用誘導透射濾光片結構來設計以滿足公司製程需求。要製鍍誘導透射濾光片需要了解單一層薄膜特性，之後再依照各材料單一層的特性來設計誘導透射濾光片。第一次堆疊多層結構時，穿透光譜特性未達到技術規格，原因為Ag薄膜層不平整，所以以通氮氣、降低Ag鍍率使Ag薄膜更平整，然而通氮氣沒有使Ag更平整還會增加未知數，因此製鍍Ag不通氮氣；第三次IR 550穿透峰值強度未達規格而且從SEM看Ag厚度偏厚，所以在堆疊結構時使Ag薄膜變薄；第四次IR 550穿透峰值強度更低，原因為Ag沒有形成薄膜。之後讓Ag變厚，而且Ag的鍍率會影響到其折射率，所以Ag改回0.5Å/s；第五次IR 550峰值強度符合而位置不符合技術規格，只要調整氧化物厚度即可得到符合技術規格的IR 550。而IR 580、IR 940、IR970依照IR 550的經驗調整介電質厚度即可。

In this experiment, the bandpass filter is made according to the company's production and demand requirements. Because the process is simple, the induced transmittance filter structure is used to meet the company's process requirements. To manufacture a induced transmittance filter, it is necessary to understand the characteristics of a single layer of film, and then design the induced transmittance filter according to the characteristics of a single layer of each material. When the multilayer structure was stacked for the first time, the transmittance spectrum did not meet the specifications. The reason was that the Ag film layer was not flat. Therefore, reducing the growth rate of the Ag film and passing through nitrogen gas to chambers were made it flatter. However, the nitrogen gas did not make the Ag flatter and increased unknown. Therefore, growing Ag does not pass through nitrogen. The third IR 550 transmittance peak intensity was below the specification and the Ag thickness was thicker from the SEM, so next round would make the Ag thinner. The fourth IR 550 transmittance peak intensity was lower than third IR 550 because Ag did not form a film. In next round, make Ag film thicker. The growth rate of Ag will affect its refractive index. Therefore, Ag is changed back to 0.5 Å/s. The fifth IR 550 peak intensity meet the specifications, but the peak position does not meet the specifications. As long as the oxide thickness is adjusted, the IR 550 conforming to the specifications can be obtained. The IR 580, IR 940, and IR970 can adjust the dielectric thickness according to the experience of the IR 550.

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