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研究生: 佘立維
Li-Wel She
論文名稱: 斜向磁控濺鍍銦錫氧化物透明導電膜之光吸收特性研究
Absorption property optical property of indium-tin-oxide (ITO) films deposited by glancing-angle sputter system
指導教授: 李亞儒
Lee, Ya-Ju
學位類別: 碩士
Master
系所名稱: 光電工程研究所
Graduate Institute of Electro-Optical Engineering
論文出版年: 2011
畢業學年度: 99
語文別: 中文
論文頁數: 35
中文關鍵詞: 斜向濺鍍ITO奈米柱
論文種類: 學術論文
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  • 本論文是利用斜向磁控濺鍍系統成長銦錫氧化物於具有奈米柱結構的矽基板上。系統地分析及量測斜向濺鍍ITO之形態分佈、穿透反射率以及導電性,進而探討斜向濺鍍薄膜ITO之光吸收特性,並將其薄膜應用在具奈米柱結構的矽基板太陽能電池上。首先製作奈米柱,奈米柱是利用鎳薄膜進行快速熱退火形成奈米鎳球當作蝕刻的遮罩進行乾式蝕刻奈米柱300nm。斜角濺鍍則是以射頻濺鍍系統將ITO薄膜成長在半導體基板上,並以掃瞄式電子顯微鏡觀察其柱狀傾斜角的形態。最後透過光學分析的方式量測折射及反射率。折射率是以橢圓儀量測,反射率則是利用不同波段的雷射光以及白光透過積分球量測取得。本研究成功製作出一傾斜角度為50o,反射率約為10%,折射率為1.7的斜向ITO奈米柱抗反射薄膜。

    第一章序論 1 1-1 研究動機 1 1-2研究目的 2 第二章文獻回顧 3 2-1透明導電膜之種類 3 2-2 ITO物理濺鍍原理 4 2-3斜角濺鍍原理 5 2-4 奈米柱製作 7 2-5 漸變多層膜 8 2-6 傳輸線模型理論 11 第三章實驗方法與結果 15 3-1 元件結構流程 15 3-2斜向真空濺鍍膜系統架設 16 3-3濺鍍鎳薄膜 17 3-4 快速熱退火 18 3-5 乾式蝕刻奈米柱 20 3-6 斜角濺鍍ITO 23 3-7 濺鍍鋁電極 25 第四章量測結果與討論 28 4-1 TLM傳輸線模型量測 28 4-2 漸變折射率多層膜量測分析 29 4-3 反射率量測分析 30 參考文獻 32

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