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研究生: 丁一介
YI-Chieh TING
論文名稱: 脈衝雷射蒸鍍法製備氧化鏑鋅薄膜的探討: 結構、光學與磁性研究
Study of Dysprosium-doped ZnO Thin Films Grown by pulsed-laser deposition: Structural, Optical, and Magnetic Properties
指導教授: 駱芳鈺
Lo, Fang-Yuh
學位類別: 碩士
Master
系所名稱: 物理學系
Department of Physics
論文出版年: 2014
畢業學年度: 102
語文別: 中文
論文頁數: 62
中文關鍵詞: 稀磁性半導體氧化鋅室溫鐵磁性
英文關鍵詞: DMS, ZnO, Dy, hysteresis loop
論文種類: 學術論文
相關次數: 點閱:382下載:25
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  • 利用脈衝雷射沉積法製備摻雜鏑的氧化鋅薄膜,鏑的原子莫耳濃度介於1~10%之間。在氧氣壓力3×10-1mbar的鍍膜條件下,X光繞射顯示樣品維持原有的晶體結構,沒有雜質態產生。因為薄膜的厚度只有150nm左右,拉曼散射光譜只獲得微弱的訊號。純氧化鋅PL光譜只有本質激發,缺陷發光是Dy摻雜造成,多為鋅空缺及鋅間隙。有摻雜Dy的薄膜在室溫皆具有鐵磁性,低溫(5K)則為順磁性。

    Dysprosium doped ZnO (Zn1-xDyxO) thin films were grown on c-sapphire by pulsed-laser deposition. The nominal Dy concentration is between 1 and 10 at%. The oxygen pressure of crystal growth is 3×10-1mbar and the thickness of thin films is 150nm. X-ray diffraction patterns show that there is no secondary phase. No distinguishable ZnO oscillation mode was observed from Raman-scattering spectroscopy because the thickness of the thin films is only 150nm. Photoluminescence spectroscopy of pure ZnO shows only emissions from band gap. Increasing in defect emissions as Dy concentration increases. The major defects are zinc vacancy and interstitial zinc. Room temperature m-H curves show hysteresis loops for all Dy doped samples. The low temperature (5K) m-H curves show only paramagnetism.

    Chapter 1 序論 1 Chapter 2 背景知識 3 2.1 氧化鋅(ZnO)、鏑(Dy)與藍寶石基板(Sapphire)性質 3 2.2脈衝雷射蒸鍍法(Pulsed Laser Deposition, PLD) 5 2.2.1 原理 5 2.2.2 不同氧壓氧化鋅電漿團 6 2.2.3 PLD鍍膜系統 7 2.3光致螢光(Photoluminescence, PL) 9 2.3.1基本原理 9 2.3.2氧化鋅PL發光機制 11 2.4 X光繞射(X-Ray Diffraction, XRD) 13 2.4.1原理 13 2.4.2布拉格繞射 14 2.4.3 X-ray繞射分析 15 2.5拉曼散射光譜(Raman-scattering spectroscopy) 16 2.6 X光光電子能譜儀(X-ray photoelectron spectroscopy, XPS) 17 2.7超導量子干涉儀(Superconducting Quantum Interference Device , SQUID)與磁性簡介 19 2.7.1超導量子干涉儀(SQUID)簡介 19 2.7.2磁性簡介 20 2.7原子力顯微鏡(Atomic Force Microscope AFM) 23 Chapter 3 實驗過程 24 3.1鍍膜條件 24 Chapter 4 結果與討論 26 4.1氧化鋅摻雜不同濃度鏑元素鍍膜速率分析 26 4.2氧化鋅摻雜不同濃度鏑元素XPS成份分析 27 4.3氧化鋅摻雜不同濃度鏑元素表面形貌與粗糙度分析 29 4.3.1退火樣品 29 4.4氧化鋅摻雜不同濃度鏑元素XRD分析 31 4.5氧化鋅摻雜不同濃度鏑元素拉曼散射光譜分析 32 4.5.1無退火樣品 32 4.5.2退火樣品 34 4.6氧化鋅摻雜不同濃度鏑元素PL光譜分析 35 4.7氧化鋅摻雜不同濃度鏑元素SQUID磁性分析 45 4.7.1外加磁場與磁矩關係 45 4.7.2等效磁矩計算 50 4.7.3零場冷卻(Zero field cooled, ZFC) 與場冷卻(Field cooled, FC) 52 Chapter 5 結果討論與未來展望 54 參考文獻 55 附錄 58 氧化鋅摻雜不同濃度鏑元素光致螢光PL分析 58 氧化鋅摻雜不同濃度鏑元素薄膜結構XRD分析 59

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