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研究生: 侯勁龍
Hou, Jin-Long
論文名稱: 熱穩態金屬與超導材料奈米針:製備與場發射特性
Thermally Stable Metal and Superconducting Material Nanotips: Fabrication and Field Emission Characteristics
指導教授: 傅祖怡
Fu, Tsu-Yi
黃英碩
Hwang, Ing-Shouh
學位類別: 博士
Doctor
系所名稱: 物理學系
Department of Physics
論文出版年: 2017
畢業學年度: 105
語文別: 中文
論文頁數: 84
中文關鍵詞: 鈮奈米針熱穩態形貌功函數場發射電流
英文關鍵詞: niobium nanotip, thermally stable configuration, work function, field emission current
DOI URL: https://doi.org/10.6345/NTNU202203292
論文種類: 學術論文
相關次數: 點閱:123下載:19
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  • 本研究以超高真空場離子顯微鏡研究超導材料奈米針的特性。我們使用鈮發展了一套可靠的熱穩態奈米針製程,其針頂分佈形貌為{100}、{310}、{110}、{123} 與{111}面排列而成,且在<100>軸向形成四個{310}面環繞擴張而堆疊的奈米凸起,此結構可作為一個收斂的場發射束使用。經過氖氣或氙氣不同覆量的鋪覆後發現可降低{100}面的功函數,其中使用氖氣可降至最低的功函數條件為5朗繆爾,其值為3.63±0.08 eV,使用氙氣可降至最低的功函數條件為1.7朗繆爾,其值為3.50±0.04 eV,並此最佳條件下均可增加場發射電流的穩定性。此熱穩態的鈮奈米針結構在經過氧氣的場效蝕刻過程後,依然可藉由熱處理而再次重現。最後我們也討論了其他材料系統的熱穩態奈米針特性。

    The characteristics of superconducting material nanotip is studied with UHV field ion microscope. We present a reliable method for a niobium tip with the thermally stable configuration of the cap part consists of {100}、{310}、{110}、{123} and {111}. The <100> directional nano-protrusion surrounded by four {310} facets can be used as a self-collimated field electron emitter. After exposing Ne or Xe gas at different coverage, the work function of {100} decreased to minima of 3.50±0.04 eV for Xe (1.7 Langmuir) and 3.63±0.08 eV for Ne (5 Langmuir); moreover, the field emission current stability was enhanced. The thermally stable configuration of Nb nanoemitter can be regenerated by thermal treatment from field-assisted oxygen etching process. Finally, we also discussed the characteristics of other thermally stable nanotip systems.

    致謝 I 摘要 II ABSTRACT III 第一章 緒論 1 1-1研究奈米針的動機 1 1-2研究鈮的動機 2 1-3奈米針發展簡介 3 第二章 實驗儀器與原理 8 2-1場發射顯微鏡成像原理 8 2-2場離子顯微鏡 11 (一) 成像原理 11 (二) 場蒸發與場退吸附 15 2-3 實驗儀器裝置 17 (一) 真空系統 18 (二) 高壓源裝置 18 (二) 低溫裝置 19 (四) 成像系統 21 (五) 電流量測裝置 22 2-4 熱穩態皺化結構之原理 23 2-5 場效蝕刻型奈米針之原理 25 第三章 樣品製備 27 3-1多晶線材的熱處理 27 3-2線材蝕刻 28 3-3 退火與場蒸發清潔 31 3-4 晶面分佈繪製 33 第四章 實驗結果與討論 36 4-1多晶鈮線未加熱處理之結構觀察 36 4-2 熱穩態奈米鈮針成長 37 (一)成長條件 37 (二)結構重複性 39 (三)場發射圖像 41 (四)鈮針頂半球熱穩態結構 45 4-3 鋪覆氣體後場發射特性比較 47 (一)鋪覆氣體後功函數變化 48 (二)鋪覆氣體後場發射電流穩定性 51 4-4 場效蝕刻法之鈮奈米針 53 4-5 其它熱穩態奈米針 60 (一)貴金屬覆鎢系統 60 (二)氧氣誘發銥針系統 71 (三)氫、氧誘發鎳針系 76 (四)總結 78 第五章 結論 80 5-1 熱穩態奈米鈮針製備與結構特性 80 5-2 熱穩態奈米鈮(100)針場發射特性 80 5-3 鈮針場效蝕刻研究 80 5-4 熱穩態奈米針製備與結構比較 81 參考資料 82

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