本實驗利用電化學電鍍方式在單晶銅(100)電極上成長鎳薄膜，同時使用循環伏安法(Cyclic Voltammetry)、電化學磁光柯爾效應系統(EC-MOKE)、電化學掃描式電子穿隧顯微鏡(EC-STM)來研究單晶銅(100)上所成長鎳薄膜的表面特性與磁特性。
實驗使用銀當作電化學參考電極，此電極屬於pseudo-reference electrode，其電位利用能士特方程式計算與文獻參考比較結果，與標準氫電極電位差大約是+87~130 mV 之間。經過多次實驗測試，在本實驗系統中數據呈現高再現性。以循環伏安法檢測，單晶銅(100)電極在1 mM HCl電解液中電化學過程，發現電流成對峰值：銅溶解與銅沉積，往陰極方向加大範圍掃描，-800 mV(vs Ag)開始有氫氣產生反應(質子還原：H++e-→1/2H2)出現。加入鎳的電解液1 mM HCl+1 mM NiCl2則出現另外一個成對峰值分別在-1200 mV與-400 mV，實驗數據顯現此對峰之間相關性甚大，推測是鎳的吸附(Ni2++2e-→Ni)與退吸附(Ni→Ni2++2e-)反應。選擇在-1200 mV電位下電鍍鎳，控制電鍍時間以製造不同鎳膜厚度，透過積分CV圖的鎳退吸附峰算出電荷量和已知電鍍面積(0.292 cm2)可分析沉積鎳的膜厚。電解液裡的氯離子會修飾銅(100)電極表面，透過STM掃描圖像可以觀察到銅(100)表面直角台階的特徵。
電鍍鎳/銅(100)磁性行為主要分成四部分結論：(1)在1.52 ML以下沒有磁性原因是電鍍鎳量很少又加上氫氣產生的效應。 (2)在2.47~7.05 ML認為是磁異向能的轉換，易軸變成Polar方向，表示有垂直磁異向能出現，與UHV系統有相同的現象發生。 (3)在13.4 ML~29.0 ML之間的磁化易軸變成平行樣品表面，趨向塊材現象以形狀異向性為主要因素。隨著厚度增加殘磁逐漸變大，因此越厚的鎳層需要更大能量才能磁化。 (4)鎳退吸附後In-situ量測L-MOKE還有磁性的現象是在13.4 ML以上才有，推測是電鍍厚度越厚，水溶液離子數變少，使得水溶液導電度不夠無法將鎳退吸附掉。

The electrodeposition of Ni on a Cu(100) electrode in diluted hydrochloric acid was investigated by means of cyclic voltammetry (CV), electrochemical scanning tunnelling microscopy (EC-STM) and electrochemical magneto-optic Kerr effect (EC-MOKE). Silver was used as the electrochemical reference electrode which belongs to one kind of pseudo-reference electrodes. With Ag reference electrode, the potential converted to normal hydrogen electrode (NHE) is about +80~130 mV. In pure supporting electrolyte (1 mM HCl), the typical current peak pair in the CV measurements corresponds to copper dissolution and re-deposition. Hydrogen evolution reaction (HER) starts at E=-800 mV (vs Ag). STM images show well right-angle steps for the adsorption of chloride anions from hydrochloric acid solutions. After adding 1 mM NiCl2, new peak pair appears at -1200 mV and -400 mV which correspond to nickel deposition and dissolution. Systematic investigation for different nickel thickness has been performed by depositing at -1200 mV for different period. The thickness has been calculated by integrating the area under the anodic dissolution peak which gives the total amount of charge passed on a surface area of the deposit.
Magnetic properties of Ni/Cu(100) was observed at the potential smaller than -700 mV. As the Ni thickness increases, it can be distributed three regions. (1) Under 1.52 ML: No magnetic hysteresis appears. This is due to too little Ni deposit and hydrogen evolution reaction. (2) 2.47~7.05 ML: Magnetic easy axis is out-of-plane. Perpendicular magnetic anisotropy appears. This is comparable with UHV system. (3) 13.4~29.0 ML: Magnetic easy axis changes to be in-plane due to the shape anisotropy. After sweeping to the potential for nickel dissolution, in-situ L-MOKE measurement shows that the magnetization remains for films thicker than 13.4 ML. This may be due to the lowered conductivity of the electrolyte.

[1] M. T. Johnson, P. J. H. Bloemen, F. J. A. den Broeder and J. J. de Vries, Rep. Prog. Phys., 59, 1409-1458 (1996)
[2] W. J. M. de Jonge, P. J. H. Bloemen, and F. J. A. den Broeder,Ultrathin Magnetic Structures, Edited by J. A. C. Bland and B. Heinrich, Springer-Verlag, Berlin(1994)
[3] 胡裕民、黃榮俊，物理雙月刊，二十二卷六期，552 (2000)
[4] P. Andreyev, 微滑動磁頭技術推進高速行動硬碟的發展，電子工程專輯，125 (2005)
(http://www.eettaiwan.com/ART_8800316257_628626_TA_4523dd74.HTM)
[5] M. Wilms, M. Kruft, G. Bermes, and K. Wandelt, Rev. of Sci. Instrum. , 70, 9 (1999)
[6] F. Carcia, A.D. Meinhaldt, A. Suna, Appl. Phys. Lett., 47, 178 (1985)
[7] C.J. Lin, G.L. Gorman, C.H. Lee, R.F.C. Farrow, E.E. Marinero, H.V. Do, H. Notarys, J. Magn. Magn. Mater., 93, 194 (1991)
[8] A. J. Bard and L. R. Faulkner, Electrochemical methods Fundamentals and Applications, John Wiley & Son, Inc., New York (2001)
[9] 胡啟章，電化學原理與方法，五南圖書，台北(2002)
[10] P. Broekmann, M. Wilms, M. Kruft, C. Stuhlmann, and K. Wandelt, Journal of Electroanalytical Chemistry, 467,307-325(1999)
[11] 洪詩惠，國立中央大學化學所碩士論文(2004)
[12] B. D. Cullity, Introduction to Magnetism and Magnetic Materials, Addison Wesley, New York (1972); B. Schulz, R. Schwarzwald and K. BAberschke, Surf. Sci.,307, 1102-8(1994)
[13] C. Kittel, Introduction to Solid State Physics, 7th ed., John Wiley & Sons INC., New York(1996)
[14] 何慧瑩，國立臺灣師範大學物理所碩士論文(1998)
[15] 魏淑宜，國立臺灣師範大學物理所碩士論文(2007)
[16] B. Schulz and K. Baberschke, Phys. Rev. B , 50, 13467-71(1994)
[17] 蔡志申，物理雙月刊，二十二券五期，605 (2003)
[18] J. D. Jackson, Classical Electrodynamics, 3rd ed., John Wiley & Sons INC., New York, 219-221(1998)
[19] 楊正旭，私立輔仁大學物理所碩士論文(1999)
[20] 聶亨芸，國立清華大學材料科學工程所碩士論文(2002)
[21] 田福助，電化學-理論與應用,高立圖書有限公司,台灣(1987)
[22] P. Allongue et al., Surf. Sci. 603, 1831-1840(2009)
[23] 吳和虔，國立中央大學化學所碩士論文(2001)
[24] K. M. Poduska and S. Morin, Rev. of Sci. Instrum., 74, 11(2003)
[25] C. A. F. Vaz, J. A. C. Bland and G. Lauhoff, Rep. Prog. Phys., 71, 056501(2008)
[26] 白鴻陞，國立中正大學物理所碩士論文(2007)
[27] S. Huemann, N. T. M. Hai, P. Broekmann, and K. Wandelt, J. Phys. Chem. B, 110, 24955-24963(2006)
[28] 李育鴻，國立臺灣師範大學物理所碩士論文(2008)
[29] M. Pourbaix, Atlas of electrochemical equilibria in aqueous solutions, 2nd ed., National Association of Corrosion Engineers, Houston, Texas, USA, 333(1974)