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研究生: 楊智仲
Chih-Chung Yang
論文名稱: 厚膜光阻製程應用於靜電驅動旋轉式微致動器之研製
Fabrication of the electrostatic micro rotational actuator by thick photoresist process
指導教授: 楊啓榮
Yang, Chii-Rong
學位類別: 碩士
Master
系所名稱: 機電工程學系
Department of Mechatronic Engineering
論文出版年: 2004
畢業學年度: 92
語文別: 中文
論文頁數: 109
中文關鍵詞: SU-8厚膜光阻蝕刻釋放技術連桿驅動機構靜電式微致動器
英文關鍵詞: SU-8 thick resist, etch release technique, linkage-drive mechanism, electrostatic actuator
論文種類: 學術論文
相關次數: 點閱:338下載:37
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  • SU-8厚膜光阻利用一般的微影製程,即可製作高深寬比的微結構。目前SU-8光阻主要是應用於LIGA電鑄製程之模板、熱壓成形之模仁、微光合成形、光波導、微流體應用流道或微機械結構等之材料,在直接將SU-8光阻作為微致動器結構材料的研究並不多見。本研究目的即是結合低成本的SU-8厚膜光阻製程與矽蝕刻釋放技術,開發一體成型之靜電式微致動器。利用SU-8厚膜光阻容易微影成形,及材質強度與熱穩定佳之特性,將其直接作為靜電式微連桿驅動機構的本體材料,不用電鑄程序翻製成金屬結構,可避免SU-8光阻去除性不佳的困擾。以SU-8光阻作為微致動器材料,其驅動反應速率將可大於金屬結構微致動器,減少驅動輸入功率的消耗。全SU-8厚膜光阻的製程與微結構,其優點為低成本、可降低微致動器因組裝所造成的誤差,利用間接驅動方式增加致動器的作動行程。製作完成之靜電式致動器,經局部結構釋放且鍍金屬膜後,成功地以直流150伏特電壓驅動。

    The research has developed the electrostatic micromechanism-drive actuator through the combination of low-cost SU-8 thick resist process and etch release technique. The SU-8 thick resist process can be used to fabricate the high aspect ratio microstructures that can add the strength and the electrical properties of microdevices. Moreover, the SU-8 resist is used as the body material of micromechanism; this can directly avoid the stripped difficulty and inconvenient assembly like MUMPs process. Besides, the microactuator fabricated by SU-8 can make the driving response larger than the one fabricated by metal. We have finished electrostatic actuator that was all in one not assembled. Advantages of electrostatic actuator are low cost, decrease microstructures assembled tolerances and increase active range of micromechanism by being driven indirectly. In our study, Electrostatic actuators that was sputtered metal, are driven by DC 150 V.

    摘要 Ⅰ 總目錄 Ⅲ 圖目錄 Ⅴ 表目錄 Ⅹ 第一章 緒論 1 1.1 研究動機 1 1.2 SU-8厚膜光阻 5 1.3 論文架構 10 第二章 文獻回顧 11 2.1 SU-8厚膜光阻於微機電領域之應用 11 2.1.1 製程特性之研究 11 2.1.2 SU-8厚膜光阻之應用研究 13 2.2 靜電式微致動器 29 第三章 微致動器之設計與製程規劃 37 3.1 靜電式微致動器之設計 37 3.1.1 元件結構設計 37 3.2 靜電式微致動器之製程規劃 44 3.2.1 製程規劃 44 3.2.2 電性驅動測試 46 3.3 實驗設備 51 第四章 實驗結果與討論 58 4.1 厚膜光阻製程 58 4.1.1 初始光罩尺寸之製作結果討論 58 4.1.2 新光罩尺寸之製作結果討論 86 4.2 電性驅動測試 101 第五章 結論 103 參考文獻 106

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