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研究生: 吳承恩
Wu, Cheng-En
論文名稱: 鎳鐵合金二維磁振子晶格之鐵磁共振譜研究
The Ferromagnetic Resonance Spectra of 2-Dimensional Permalloy Magnonic Crystals
指導教授: 江佩勳
Jiang, Pei-hsun
口試委員: 江府峻
Jiang, Fu-Jiun
江宏仁
Jiang, Hong-Ren
江佩勳
Jiang, Pei-hsun
口試日期: 2023/07/14
學位類別: 碩士
Master
系所名稱: 物理學系
Department of Physics
論文出版年: 2023
畢業學年度: 111
語文別: 中文
論文頁數: 38
中文關鍵詞: 鐵磁性材料鐵磁共振磁振子晶格
英文關鍵詞: Ferromagnetic materials, ferromagnetic resonance, magnonic crystals
研究方法: 實驗設計法準實驗設計法現象學次級資料分析調查研究主題分析比較研究觀察研究文件分析法現象分析
DOI URL: http://doi.org/10.6345/NTNU202301717
論文種類: 學術論文
相關次數: 點閱:82下載:2
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  • 在這篇研究中,我們回顧了不同形狀、直徑、厚度的Py圓點陣列對鐵磁共振(ferromagnetic resonance, FMR)造成的影響。並且為了提高磁性薄膜的磁性能,對不同的墊材進行研究。

    在這項實驗中,我們使用了電子束微影技術分別製作薄膜和直徑為5 μm,邊對邊間距為5 μm,厚度為30 nm的鎳鐵合金圓點陣列。並且透過電子束蒸鍍儀系統在室溫條件下成長樣品。我們選擇了共平面波導(Coplanar waveguide, CPW)的樣品結構,利用向量網路分析儀(vector network analyzer, VNA)輸入微波信號,在外加磁場的作用下,測量了鐵磁共振(ferromagnetic resonance, FMR)現象。

    In this study, we examined the influence of Py (Permalloy) dot arrays with different shapes, diameters, and thicknesses on ferromagnetic resonance (FMR). Additionally, we investigated different underlayers in order to enhance the magnetic properties of thin films.
    In this experiment, electron beam lithography was used to fabricate thin films and permalloy dot arrays with a diameter of 5 μm, a spacing of 5 μm, and a thickness of 30 nm. These arrays were grown using an electron beam evaporation system at room temperature. We selected a sample structure based on a coplanar waveguide (CPW) and employed a vector network analyzer (VNA) to introduce microwave signals. Under the influence of an externally applied magnetic field, we measured the phenomenon of ferromagnetic resonance (FMR).

    致謝 i 目錄 ii 圖目錄 iii 摘要 v Abstract vi 第一章 理論基礎與文獻回顧 1 1.1 磁性材料(magnetic materials) 1 1.2 磁性材料中的能量 2 1.3 鐵磁共振(ferromagnetic resonance, FMR) 5 1.4 磁振子晶格(magnonics crystals) 8 1.5 自旋波(spin waves) 9 1.6 共平面波導(coplanar waveguide, CPW) 10 1.7 文獻回顧 10 1.8底層墊材對磁性材料之影響 20 第二章 儀器介紹 23 2.1 接觸式光罩曝光機 23 2.2 場發射掃描式電子顯微鏡(field emission scanning electron microscopy, SEM) 24 2.3 電子束蒸鍍儀(e-beam evaporation) 25 2.4 向量網路分析儀(vector network analyzer, VNA) 27 第三章 樣品製程 28 3.1 電子束微影(E-beam lithography, EBL) 28 3.2 黃光微影製程(photo lithography) 30 第四章 結果與討論 32 4.1 FMR數據測量 32 4.2 有效磁化場 33 未來展望 35 附錄 36 缺點及造成失敗原因 36 1. 以電子束微影製作CPW 36 2. 未添加墊材 36 參考文獻 37

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