研究生: |
吳俊緯 Jim-Wei, Wu |
---|---|
論文名稱: |
電弧放電應用於陽極接合速度與品質之研究 Research on speed and quality of anodic bonding by applying arc discharge |
指導教授: |
楊啓榮
Yang, Chii-Rong |
學位類別: |
碩士 Master |
系所名稱: |
機電工程學系 Department of Mechatronic Engineering |
論文出版年: | 2007 |
畢業學年度: | 95 |
語文別: | 中文 |
論文頁數: | 109 |
中文關鍵詞: | 陽極接合技術 、特殊電極陣列 、電弧放電 、放電間隙 |
英文關鍵詞: | anodic bonding technology, arrangement of special electrode, arc discharge, discharge gap |
論文種類: | 學術論文 |
相關次數: | 點閱:213 下載:0 |
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陽極接合技術常被應用於微機電元件的組裝,是目前微機電製程中相當倚重的一種接合技術。主要藉由離子鍵結的方式來達到接合的目的;故兩接合表面平整度要求非常高,屬於無介質的接合方式。而接合過程中電極的幾何形狀可造成不同的接合效果,原因是當通入直流電壓時,首先發生接合現象是在上電極與玻璃接觸的下方。若選用大面積的上電極;使電極完全的與玻璃晶片接觸,平均電場的分佈可使電極下方同時發生接合。因而可改善接合的速度,但接合的品質並沒有單點電極來的好,原因在大面積的電極在接合時,會在介面上產生氣孔。對於單點式電極,其接合區域是慢慢擴張出去,因此接合面的殘存氣體也會被驅趕出去,不易形成氣泡,接合品質相當好,但接合速度相當緩慢。
本研究提出一種新式的電弧放電接合方式,並搭配特殊電極幾何形狀的排列方式,來改善陽極接合的速度及氣泡問題。實驗結果證實,利用輻射狀線電極在定電壓900 V、溫度400 ℃及放電間隙120 um條件下,進行4吋晶片接合時,接合時間約為17秒,且接合良率可至99.98 %左右。
Anodic bonding techniques are often used in MEMS components assembly, which is the micro-electromechanical system is heavily dependent on the process of a mount technology. Mainly through the ionic bond to attain the purpose of bonding; Both bonding surface roughness is high Media is no way of bonding. And the bonding process of electrode geometry can cause different interface effects, because when passed through DC voltage, First bonding phenomena occur on the electrode is in contact with the bottom of the glass. If the choice of a large area on the electrode; Planer electrode full contact with the glass chips, The average distribution of the electric field can simultaneously bottom electrode interface. It can improve the interface speed, but the quality of engagement and no single point electrodes to the good, reason for the large area of the electrode interface, the interface will have a stoma. For single-electrode, its interface region is slowly expanding out, the residual gas washer will be evicted Bubble formation is not easy, the interface quality is very good, but the bonding speed has been rather slow.
This study proposes a new type of interface arc discharge method, and a special mix of electrode geometry of the arrangement. anodic bonding to improve the speed and bubble problem. The experimental results confirmed that the use of radial line in determining electrode voltage 900 V, temperature of 400 ° C and discharge gap 120 um conditions, Bonding time of four-inch chip is about 17 seconds, and Bonding ratio to be about 99.98 %.
1. 楊啟榮等人, "微機電系統技術與應用", 精密儀器發展中心, 第四章,
pp. 142 (2003).
2. V. Dragoi, M. Alexe, M. Reiche, and U. M. Gösele, ECS Meeting Abtracts, MA 99-2, 972 (1999).
3. 楊啟榮等人, "微機電系統技術與應用", 精密儀器發展中心, 第十章,
pp. 791 (2003).
4. F. Secco d’Aragona, T. Iwamoto, H.-D. C. Chiou, and A. Mizza, ECS Meeting Abtracts, MA 97-2, 2052 (1997).
5. G. Wallis and D. I. Pomerantz, J. Appl. Phys., 40, 3946 (1969).
6. G. Klink and B. Hillerich, SPIE Conf. On Micromachined Devices and Components, Santa Clara, CA SPIE 3512, pp.50-61 (1998).
7. 彭子杰, "放電加工機開放架構式電腦數值控制研究", 大葉大學機電自動化研究所, 碩士論文, pp. 6-10 (2005).
8. 陳兆桐, "智慧型放電波形偵測與放電加工控制研究", 大葉大學機電自動化研究所, 碩士論文, pp. 6-9 (2006).
9. 賴耿陽, "IC製程之濺射技術", 復漢出版社, pp. 6-10 (1997).
10. D. S. Rickerby and A. Matthews, “Advanced Surface Coatings: a Handbook of Surface Engineering”, Blackie & Son Limited, Bishopbriggs, London, (1991).
11. Vossen, John .L. and Kern, Werner, “Thin film processes II”, Academic Press, (1991).
12. 陳凱林, "半導體濺鍍靶材製程技術與薄膜特性", 工業雜誌, 第19期(2003).
13. 周長彬 等人, "銲接學", 全華科技圖書股份有限公司, 第二章, pp. 1-5 (2005).
14. S. Shoji, H. Kikuchi and H. Torigoe, “Low-temperature anodic bonding using lithium aluminosilicate-β-quartz glass ceramic”, Sensors and Actuators, A64, 95-100 (1998).
15. Y. Kana . K. Mazunori, C. Muradnm, and J. Sugaya, Sensors and Actuators, A21-23, 939 (1990).
16. M. Despont, H. Gross, F. Arrouy, C. Stebler and U. Staufer, “Fabrication of a silicon-Pyrex-silicon stack by a.c. anodic bonding”, Sensors and Actuators, A55, pp.219-224 (1996).
17. K. B. Albaugh, “Rate processer during anodic bonding”, J. Am. Ceram. Soc, V75, pp.2644 (1992).
18. M. A. Morsy, K. Ikenchi, M. Ushio and H. Abe, “Mechanism of enlargement of intimately contacted area in anodic bonding of kovar alloy to borosilicate glass”, Material Transaction JIM, V37, pp.1511 (1996).
19. T. R. Anthony, “Anodic bonding of imperfect surfaces, J. Appl. Phys., 54, pp.2419-2428 (1983).
20. 邱國麟, "射頻磁控濺鍍金屬膜於矽晶片與Pyrex 7740玻璃陽極接合之研究", 彰化師範大學機電工程學系, 碩士論文, pp. 10-15 (2004).
21. K. B. Albaugh and P. E. Cade, “Mechanisms of anodic bonding of silicon to Pyrex glass”, IEEE, 88, pp.109-110 (1988)
22. 楊啟榮, "微機電系統原理與應用", 國立臺灣師範大學課程講義, (2005).
23. M. A. Schmidt, “Wafer-to-wafer bonding for microstructure formation”, IEEE, pp.1575-1585 (1998)
24. J. Wei, H. Xie, M. L. Nai, C. K. Wong and L. C. Lee, “Low temperature wafer anodic bonding”, J. Micromech. and Microeng., pp.217-222 (2003).
25. Q. Y. Tong and U. Gosele “Semiconductor wafer bonding science and technology”, John Wiley & Sons INC. USA (1999).
26. B. Puers and D. Lapadatu, “Extremely miniaturized capacitive movement sensors using new suspension systems ”, Sensors and Actuators, A41-A42 129-35 (1994).
27. A. Cozma and B. Puers, “Characterization of the electrostatic bonding of silicon and Pyrex glass”, J. Micromech. and Microeng., pp.98-102 (1995)
28. B. Puers, E. Peeters, A. Van Der Bossche and W. Sansen ,, “A capacitive pressure sensor with low impedance output and active suppression of parasitic effect”, Sensors and Actuators, A21-A23 108-14 (1990).
29. M. C. Lee, S. J. Kang, K. D. Jung, S. H. Choa Y. C. Cho, “A high yield rate MEMS gyroscope with a packaged SiOG process”, J. Micromech. and Microeng., pp.2003-2010 (2005)
30. T. Michael “Anordnung von elektroden zum anodischen bonden” DE 4423164A1 (1996).
31. H. Michael “Electrode zum anodischen bonden” DE 4426299A1 (1996).
32. J. T. Huang, H. A. Yang “Improvement of bonding time and quality of anodic bonding using the spiral arrangement of multiple point electrodes”, Sensors and Actuators, pp.1-5 (2002).
33. 楊學安, "快速與局部加熱於陽極接合品質的研究應用", 台北科技大學製造科技研究所, 碩士論文, pp. 12-13 (2002).
34. 王輔春 等人, "工程圖學", 師友工業圖書公司, 第三章, pp.52 (1991).
35. M. H. Lee, I. M. Hsing “An improved anodic bonding process using pulsed voltage technique”, Journal of Microelectromechanical System, pp.469-473 (2000).