氮化鈦(TiN)硬質薄膜因具有高硬度、耐磨耗、抗腐蝕等特點，因此鍍在某些切削刀具、成型模具及承受高負載的零件上，可明顯延長其使用壽命，同時亦能提升被鍍材表面的平整度。而對這類硬質薄膜而言，為使在工作中能增加壽命，鍍層之要求首重在硬度與附著性。本研究即是以非平衡磁控濺鍍法製備氮化鈦薄膜於SKH9高速鋼基材上，以得到所需之要求。經實驗得知，本機參數設定在OES(%)為60~62%，偏壓為100V，電流值為0.9A，溫度持續加溫在120oC且前處理分別經三氯乙烯、鹼液、去離子水、Freon與氮氣依次清潔，濺鍍TiN階段時間40min的情形下，可得到膜厚2μm，膜層與基材附著力約達67N，硬度在20~24GPa，表面粗糙度在20~40nm的氮化鈦薄膜。另由奈米壓痕測試，除了得到所欲知的硬度值，尚可經由reduced modulus算出楊氏係數值約在290~300GPa。這對氮化鈦膜材抵抗彈性變形之能力提供更進一步的了解。

Titanium nitride (TiN) solid thin film is an important engineering material owing to its excellent hardness, good wear resistance and high corrosion resistance. Because TiN has so many characteristic as above, it has been chosen as hard film material in some applications like cutting tools, forming dies and high loading engineering devices. The TiN films can improve the working life of the substrate material and increase the surface smoothness of the tool. For improving the life of substrate, the hardness and the adhesion of thin film are very important factors. In this study, the unbalanced-magnetron sputtering system was used to deposit single-layer TiN coating on the high-speed steel (SKH9) substrate. Experimental results indicate that the thickness of TiN film was about 2μm and the interface adhesion between TiN film and substrate is about 67N. Moreover, the hardness of TiN film is about 20~24GPa and the roughness of surface varied from 20 to 40 nm. To obtain the above-mentioned results, the test conditions must be controlled. During deposition, the reactive gas of N2 was controlled by optical emission spectrometer (OES) about 60% to 62%. The biasing voltage of substrate was -100V and the target current was 0.9A. The substrate was isothermally at 120oC and the coating time was 40 minutes. Besides, the proper pre-treatment procedure was necessary. By the way, the nanoindentation test not only can obtain exact hardness value of the film, but also can gain the elastic modulus of TiN coatings about 290 to 300Gpa (the reduced modulus Er is known). It can provide advanced knowledge for elastic deformation resistance of TiN coating in MEMS or NEMS field in the near future.

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