研究生: |
莊培佑 |
---|---|
論文名稱: |
烷基碘在Ge(1 0 0)表面上之吸附及熱分解反應 Adsorption and Thermal Decomposition |
指導教授: | 洪偉修 |
學位類別: |
碩士 Master |
系所名稱: |
化學系 Department of Chemistry |
論文出版年: | 2009 |
畢業學年度: | 97 |
語文別: | 中文 |
論文頁數: | 102 |
中文關鍵詞: | 鍺金屬 |
論文種類: | 學術論文 |
相關次數: | 點閱:151 下載:0 |
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利用程溫脫附儀(TPD)及光電子能譜儀(XPS)來探測水(H2O)及烷基碘(R–I,R = CH3,C2H5及C4H9)在鍺晶體表面上的吸附及熱分解反應。TPD是用來偵測表面上經由熱分解而脫附的產物,而XPS是用來鑑定熱分解過程中的表面化學組態。
在105K時,水曝露到鍺表面即會斷氫氧鍵,形成表面氫氧基及表面氫。水在鍺金屬表面脫附反應之產物為H2O、H2及GeO。短鏈的烷基碘會於鍺金屬表面進行分解反應,較容易形成表面烷基以及碘原子吸附。105K時,甲基碘分子在表面上即會分解為甲基和碘原子,其中乙基碘及丁基碘將以分子型態吸附於表面上並且解離於105 K。於程序升溫200 至370 K,乙基碘及丁基碘之化學吸附部分將形成表面乙基及丁基,並且進行β-hydride elimination生成乙烯及丁烯於大約550 K 之時。甲基則會行disproportionation反應結合其他甲基的氫原子形成甲烷脫附,再者其中部分的甲基將自行直接脫附於720 K。
表面的碘原子,則會和氫原子結合形成氣態的碘化氫同時在650 K 以及720 K下脫附,部分存在於鍺金屬表面的碘原子則會選擇自行直接脫附於720 K,同時當反應升溫至770 K,其表面仍具有殘留的碳原子及少數的碘原子。
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