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研究生: 陳文賓
Wen-bin Chen
論文名稱: 硫酸鈉與硼酸溶液對導電玻璃ITO上鍍鈷的影響
The effects of sodium sulfate and boric acid solution on coating cobalt onto ITO substrate
指導教授: 傅祖怡
Fu, Tsu-Yi
何慧瑩
Ho, Huei-Ying
學位類別: 碩士
Master
系所名稱: 物理學系
Department of Physics
論文出版年: 2012
畢業學年度: 100
語文別: 中文
論文頁數: 77
中文關鍵詞: 磁滯曲線磁性矯頑力磁光柯爾效應循環伏安法計時安培分析法
英文關鍵詞: Hysteresis curves, magnetic, coercivity, magneto-optical Kerr effect (MOKE), cyclic voltammetry (CV), chronoamperometry (CA)
論文種類: 學術論文
相關次數: 點閱:227下載:9
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  • 本研究探討硫酸鈉與硼酸溶液對導電玻璃ITO上鍍鈷的影響。以循環伏安法找出適合的電鍍電壓,並改變不同的電解質輔助液探討對鈷膜表面的影響。我們藉由金相顯微鏡、原子力顯微鏡對鈷膜表面進行觀察,再以固定電鍍電壓的方式,分析得到電流對時間的關係,判定鈷在ITO上為接近瞬時成核的機制,並利用磁光柯爾效應測量鈷膜的磁性。
    在實驗的過程中我們發現,電解質輔助液硫酸鈉以及硼酸各有其優缺點,硫酸鈉幫助我們決定所需要電鍍的電壓以及增加還原電流,硼酸輔助液不僅可以抑制產生Co的氫氧化物,它還能讓薄膜均勻成長。我們發現硼酸的濃度明顯影響Co島的結構,並進而改變磁性之量測結果。

    The effects of sodium sulfate (Na2SO4) and boric acid (H3BO3) solution on coating cobalt onto the ITO were investigated by cyclic voltammetry (CV), metallurgical microscopy, atomic force microscope (AFM) and magneto-optical Kerr effect (MOKE).
    We looked for the proper plating voltage of Co by CV studies; we observed the topography of Co films by optical microscope and AFM. During the electrodeposition process, we monitored the relationship between current and time by chronoamperometry (CA). From analyzing the CA curves, we determined that the growth kinetic of the Co onto ITO substrate was approximately instantaneous nucleation mechanism.
    The data clearly shows that adding Na2SO4 is helpful for us to determine the proper voltage of deposition Co; it also increases the reduction current. Adding H3BO3 not only inhibits the reduction of Co hydroxide but also helps the Co nuclei to uniformly distribute on the ITO surface. The concentration of H3BO3 significantly affects the structure and varies the magnetic properties of the Co nuclei.

    圖次 6 1 緒論 10 2 基本原理 13 2.1 電雙層模式 13 2.2 法拉第定律 15 2.3 循環伏安法 15 3. 實驗設備與實驗方法 17 3.1 電化學電鍍與設備 17 3.1.1 電化學電鍍設備及電鍍液 17 3.1.2 電化學電鍍 21 3.1.3 導電玻璃ITO 22 3.2 磁光柯爾效應儀(Magneto-optic Kerr effect,MOKE) 23 3.3 原子力顯微鏡(Atomic Force Microscopy,AFM) 26 4. 實驗結果與討論 29 4.1 利用循環伏安法CV研究電鍍液的性質 29 4.1.1 循環伏安法(對照組實驗): 電鍍液成分 0.5M硫酸鈉 30 4.1.2 循環伏安法(對照組實驗): 電鍍液成分 0.11 M硼酸 34 4.1.3 循環伏安法實驗: 電鍍液成分 0.1M硫酸鈷 35 4.1.4 循環伏安法實驗: 電鍍液成分 硫酸鈷0.1 M + 硫酸鈉0.5 M 39 4.1.5 循環伏安法實驗: 電鍍液成分 硫酸鈷0.1 M + 硼酸0.11 M 43 4.1.6 循環伏安法實驗: 電鍍液成分 硫酸鈷0.1 M + 硫酸鈉0.5M + 硼酸(濃度改變) 44 4.2 利用計時安培分析法CA研究電鍍液以及鈷膜的性質 51 4.2.1 計時安培分析法: 電鍍液成分 硫酸鈷0.1 M 硫酸鈉0.5 M 硼酸 0.11M 51 4.2.2 計時安培分析法: 以金相顯微鏡觀察比較硫酸鈉電鍍液的影響 54 4.2.3 計時安培分析法: 以金相顯微鏡觀察比較不同電鍍電量的鈷膜顆粒 55 4.2.4 計時安培分析法: 以金相顯微鏡觀察比較硼酸對鈷膜顆粒數的影響 59 4.2.5 計時安培分析法: 由電流對時間變化探討鈷的成核機制 60 4.3 以原子力顯微鏡觀察鈷膜表面 64 4.3.1 硼酸對鈷膜表面輪廓的影響 64 4.4 利用磁光柯爾效應MOKE分析鈷膜磁性 67 4.4.1 探討硼酸濃度對磁性的影響 68 4.4.2 比較不同電鍍電量對磁性的影響 70 5 結論 75 6 參考文獻 76

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